To study the impact of nitrogen deposition on 1-year-old Chinese fir (Cunninghamia lanceolata) seedlings in pots, the dissolved NH₄NO₃ was sprayed on the seedlings every 3 days for 1 year. The simulated elevated N depositions were equivalent to N0(0), N1(6 gN/(m² a)), N2(12 gN/(m² a)), N3(24 gN/(m² a)) and N4(48 gN/(m² a)). The results indicated that medium N treatments (N2, N3) enhanced growth significantly. The height, stem base diameter and per-seedling biomass of Chinese fir seedlings increased with N loads and decreased in the high N treatments. Compared to N0, the height and per-seedling biomass were highest in N2 treatment and increased by 10.77% and 12.35%, respectively. The stem base diameter was highest in N3 treatment and increased by 8.81% compared to N0. The net photosynthetic rate (Pn) in treatments N1, N2, N3, N4 increased by 1.20%, 9.28%, 24.23% and 4.30%, and the highest photosynthetic rate by 67.09%, 125.32%, 148.10% and 51.90%, respectively. The N1–N3 treatments, especially N2, stimulated light compensation point (LCP) of the seedlings significantly, but N4 exhibited inhibitive effect. Compared with LCP, light saturation point (LSP) showed weaker response to N loads, positive to N2, but negative to all other N treatments. Low-to-medium N treatments (N1, N2) enhanced Chl (a + b) by 2.19% and 37.15%, while medium-to-high N treatments (N3, N4) reduced Chl (a b) by 7.95% and 15.56%, respectively. Water use efficiency (WUE) and stomatal conductance (C) decreased slightly with N loads.